is based on coating systems as described before for Electron Beam Evaporation (EBE) with the addition of a plasma source. It is directed onto the calotte and provides a bombardment of the substrates with energetic (ca.150eV) reactive Argon and Oxygen ions.
The plasma is generated by a DC-discharge with RF-heated cathode.
Caused by the strong discharge of ca. 40 amps, the molecules in the vapour are activated and ionized and lead to a better oxidation and a denser layer structure. Thermal shift due to water incorporation can be eliminated by this technique.